Minneapolis, Minnesota — March 22, 2022 — CyberOptics® Corporation (NASDAQ: CYBE), a leading global
developer and manufacturer of high-precision 3D sensing technology solutions, will present at the virtual
PhotoMask Japan, the 28th symposium on photomask and next-generation lithography mask technology on April 27, 2022 at 15:20 JST. CyberOptics is a gold sponsor of the online symposium that will be held from April 26-28, 2022.
Mr. Yukinobu Hayashi, CyberOptics’ Applications Engineer and Account Manager based in Japan, will share the technical presentation “Improving Yields and Tool Uptime with Wireless Measurement Sensors in Semiconductor Environments.” Stringent manufacturing requirements and a focus on maximizing yields
and tool uptime drives a need for best-in-class practices for a contamination-free process environment. Quickly identifying when and where airborne particles originate as well as the source of the
contamination is vital.
To address this critical need, an In-Line Particle Sensor™ (IPS™) can be used for effective semiconductor tool set-up and process diagnostics. The IPS is an extension of the industry-leading WaferSense® and ReticleSense®
Airborne Particle Sensors (APS™ and APSRQ™) that are documented by fabs as the Best-Known Method (BKM). The IPS and accompanying CyberSpectrum™ software can identify, measure, monitor and troubleshoot
particles down to 0.1µm in gas and vacuum lines 24/7/365 in semiconductor process equipment.
Contamination sources can be identified quickly and the effects of cleaning, adjustments and repairs can be seen in real-time. It is particularly relevant to EUVL tools where it can be installed at the vacuum line in
between the EUV process chamber and the vacuum pump, saving significant time compared to current
methods to check for particles. The IPS is always on and collecting particle data, which is especially critical
during chamber purging. ReticleSense® APSRQ and Auto Multi Sensors™ (AMSR™) will also be highlighted. The all-in-one AMSR can measure and monitor leveling, vibration and relative humidity (RH) in reticle environments. Overall, by adopting the IPS, APSRQ and AMSR devices, significant reductions in time and expense can be recognized, while improving yields and tool uptime.